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内容由Keith Schaub vice president of technology and strategy at Advantest, Keith Schaub vice president of technology, and Strategy at Advantest提供。所有播客内容(包括剧集、图形和播客描述)均由 Keith Schaub vice president of technology and strategy at Advantest, Keith Schaub vice president of technology, and Strategy at Advantest 或其播客平台合作伙伴直接上传和提供。如果您认为有人在未经您许可的情况下使用您的受版权保护的作品,您可以按照此处概述的流程进行操作https://zh.player.fm/legal
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Extreme Ultraviolet (EUV) lithography: Going beyond 2nm

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Manage episode 349746755 series 2908126
内容由Keith Schaub vice president of technology and strategy at Advantest, Keith Schaub vice president of technology, and Strategy at Advantest提供。所有播客内容(包括剧集、图形和播客描述)均由 Keith Schaub vice president of technology and strategy at Advantest, Keith Schaub vice president of technology, and Strategy at Advantest 或其播客平台合作伙伴直接上传和提供。如果您认为有人在未经您许可的情况下使用您的受版权保护的作品,您可以按照此处概述的流程进行操作https://zh.player.fm/legal

Producing the world's most complex and advanced semiconductors isn't rocket science; it's far more difficult and getting tougher. For example, today's most advanced AI devices are made using a 5nm process. 5nm, which in layperson's terms, is equivalent in size to two DNA strands. Imagine somehow placing billions of strands of DNA in an exact and elaborate pattern, 100 layers high, in an area that's the size of a thumbnail. In short, that is the challenge semiconductor manufacturers face when producing the most advanced AI chips.
Production of today's most advanced chips uses a cutting-edge technology called: Extreme Ultraviolet Lithography, or EUV. Listen in as Mr. Toshimichi Iwai, Senior Vice President of E-Beam Lithography at Advantest's R&D facility in Saitama, Japan, explains the history and importance of lithography in semiconductor manufacturing and the vital role that Advantest plays in enabling next-generation semiconductor devices.
Thanks for tuning in to "Advantest Talks Semi"!
If you enjoyed this episode, we'd love to hear from you! Please take a moment to leave a rating on Apple Podcast. Your feedback helps us improve and reach new listeners.
Don't forget to subscribe and share with your friends. We appreciate your support!

  continue reading

章节

1. Introduction: Advantest Latest News and Junko’s Top 3 (00:00:00)

2. Lithography Overview Simplified (00:01:59)

3. Lithography Process Described by Toshimichi Iwai (00:03:06)

4. Evolution of Lithography (00:04:25)

5. Extreme Ultraviolet lithography is required for state-of-the-art (00:05:56)

6. Deep Ultraviolet and Extreme Ultraviolet: Very different (00:07:20)

7. Double Patterning and Edge Placement Error (00:09:23)

8. Numerical Aperture Explained (00:11:07)

9. Can We Go Beyond 2nm? (00:13:53)

10. Advantest E5620 DR SEM – Design Review Scanning Electron Microscope for reviewing and classifying ultra-small defects on semiconductor photomasks (00:16:30)

11. ASML, IMEC and Advantest collaboration on next-generation chip manufacturing technology (00:19:28)

12. Toshimichi Iwai’s Final Thoughts on the Future of Lithography (00:23:28)

29集单集

Artwork
icon分享
 
Manage episode 349746755 series 2908126
内容由Keith Schaub vice president of technology and strategy at Advantest, Keith Schaub vice president of technology, and Strategy at Advantest提供。所有播客内容(包括剧集、图形和播客描述)均由 Keith Schaub vice president of technology and strategy at Advantest, Keith Schaub vice president of technology, and Strategy at Advantest 或其播客平台合作伙伴直接上传和提供。如果您认为有人在未经您许可的情况下使用您的受版权保护的作品,您可以按照此处概述的流程进行操作https://zh.player.fm/legal

Producing the world's most complex and advanced semiconductors isn't rocket science; it's far more difficult and getting tougher. For example, today's most advanced AI devices are made using a 5nm process. 5nm, which in layperson's terms, is equivalent in size to two DNA strands. Imagine somehow placing billions of strands of DNA in an exact and elaborate pattern, 100 layers high, in an area that's the size of a thumbnail. In short, that is the challenge semiconductor manufacturers face when producing the most advanced AI chips.
Production of today's most advanced chips uses a cutting-edge technology called: Extreme Ultraviolet Lithography, or EUV. Listen in as Mr. Toshimichi Iwai, Senior Vice President of E-Beam Lithography at Advantest's R&D facility in Saitama, Japan, explains the history and importance of lithography in semiconductor manufacturing and the vital role that Advantest plays in enabling next-generation semiconductor devices.
Thanks for tuning in to "Advantest Talks Semi"!
If you enjoyed this episode, we'd love to hear from you! Please take a moment to leave a rating on Apple Podcast. Your feedback helps us improve and reach new listeners.
Don't forget to subscribe and share with your friends. We appreciate your support!

  continue reading

章节

1. Introduction: Advantest Latest News and Junko’s Top 3 (00:00:00)

2. Lithography Overview Simplified (00:01:59)

3. Lithography Process Described by Toshimichi Iwai (00:03:06)

4. Evolution of Lithography (00:04:25)

5. Extreme Ultraviolet lithography is required for state-of-the-art (00:05:56)

6. Deep Ultraviolet and Extreme Ultraviolet: Very different (00:07:20)

7. Double Patterning and Edge Placement Error (00:09:23)

8. Numerical Aperture Explained (00:11:07)

9. Can We Go Beyond 2nm? (00:13:53)

10. Advantest E5620 DR SEM – Design Review Scanning Electron Microscope for reviewing and classifying ultra-small defects on semiconductor photomasks (00:16:30)

11. ASML, IMEC and Advantest collaboration on next-generation chip manufacturing technology (00:19:28)

12. Toshimichi Iwai’s Final Thoughts on the Future of Lithography (00:23:28)

29集单集

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